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dc.contributor.authorGheshlaghi, Negar
dc.contributor.authorForoutan-Barenji, Sina
dc.contributor.authorErdem, Onur
dc.contributor.authorShabani, Farzan
dc.contributor.authorHumayun, Muhammad Hamza
dc.contributor.authorDemir, Hilmi Volkan
dc.date.accessioned2022-03-01T06:57:25Z
dc.date.available2022-03-01T06:57:25Z
dc.date.issued2021en_US
dc.identifier.issn1530-6984
dc.identifier.issn1530-6992
dc.identifier.otherPubMed ID34028277
dc.identifier.urihttps //doi.org/10.1021/acs.nanolett.1c00464
dc.identifier.urihttps://hdl.handle.net/20.500.12573/1201
dc.descriptionThis research was supported in part by the National Research Foundation, Prime Minister's Office, Singapore, under its Investigatorship Program (NRF-NRFI2016-08) and the Singapore Agency for Science, Technology and Research (A*STAR) SERC Pharos Program under Grant 152 73 00025. The authors also acknowledge financial support from TUBITAK through 115E679, 115F297, and 117E713 programs. The authors thank Mr. Mustafa Guler and Mr. Ovunc Karakurt for their assistance in TEM imaging, Dr. Gokce Celik for her help on the ellipsometric measurements, Mr. Semih Bozkurt for his support on the AFM characterization, and Mr. Bilge Yagci for his assistance in optical characterization. O.E. acknowledges TUBITAK for financial support through the BIDEB-2211 program. H.V.D. gratefully acknowledges TUBA.en_US
dc.description.abstractHere, the first account of self-resonant fully colloidal mu-lasers made from colloidal quantum well (CQW) solution is reported. A deep patterning technique is developed to fabricate well-defined high aspect-ratio on-chip CQW resonators made of grating waveguides and in-plane reflectors. The fabricated waveguide-coupled laser, enabling tight optical confinement, assures in-plane lasing. CQWs of the patterned layers are closed-packed with sharp edges and residual-free lifted-off surfaces. Additionally, the method is successfully applied to various nanoparticles including colloidal quantum dots and metal nanoparticles. It is observed that the patterning process does not affect the nanocrystals (NCs) immobilized in the attained patterns and the different physical and chemical properties of the NCs remain pristine. Thanks to the deep patterning capability of the proposed method, patterns of NCs with subwavelength lateral feature sizes and micron-scale heights can possibly be fabricated in high aspect ratios.en_US
dc.description.sponsorshipAgency for Science Technology & Research (ASTAR) 152 73 00025 Turkiye Bilimsel ve Teknolojik Arastirma Kurumu (TUBITAK) 115E679 115F297 117E713en_US
dc.language.isoengen_US
dc.publisherAMER CHEMICAL SOC1155 16TH ST, NW, WASHINGTON, DC 20036en_US
dc.relation.isversionof10.1021/acs.nanolett.1c00464en_US
dc.rightsinfo:eu-repo/semantics/openAccessen_US
dc.subjectsemiconductor nanocrystalsen_US
dc.subjectdirect nanopatterningen_US
dc.subjectUV-induced ligand exchangeen_US
dc.subjectelectron beam lithographyen_US
dc.subjectmicrolaseren_US
dc.subjectoptical nanocircuiten_US
dc.subjectcolloidal quantum wellsen_US
dc.titleSelf-Resonant Microlasers of Colloidal Quantum Wells Constructed by Direct Deep Patterningen_US
dc.typearticleen_US
dc.contributor.departmentAGÜ, Mühendislik Fakültesi, Malzeme Bilimi ve Nanoteknoloji Mühendisliği Bölümüen_US
dc.contributor.institutionauthorAltintas, Yemliha
dc.identifier.volumeVolume 21 Issue 11 Page 4598-4605en_US
dc.relation.journalNANO LETTERSen_US
dc.relation.tubitak115E679 115F297 117E713
dc.relation.publicationcategoryMakale - Uluslararası - Editör Denetimli Dergien_US


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